High-resolution quantum dot photopatterning via interference lithography assisted microstamping

Tsukruk, V., E. Thomas, Z. Lin, C. Lin, J. Jung, M. Smith, Y. Yoon, G. Liang, S. Malak, and R. Thevamaran. High-Resolution Quantum Dot Photopatterning via Interference Lithography Assisted Microstamping. Vol. 121, no. 24, The Journal of Physical Chemistry, 2017, pp. 13370-8.

doi: 10.1021/acs.jpcc.7b03731